(Peer-Reviewed) Effects of minor B additions on tensile strength, fracture toughness and oxidation resistance of Nb–Si based alloys
Guangxin Sun 孙井永, Lina Jia 贾丽娜, Yu Wang, Zuheng Jin, Hu Zhang 张虎
School of Materials Science and Engineering, Beihang University, Beijing, 100191, China
中国 北京 北京航空航天大学材料科学与工程学院
Abstract
The effects of minor additions of B on microstructure, ambient tensile strength, fracture toughness and high-temperature oxidation resistance of Nb–Si based alloys were investigated. The added contents were designed as 0.05, 0.10 and 0.20 at.%. The results show constituent phases in 0.05B and 0.20B alloys were Nbss, α-Nb₅Si₃; while only 0.10B alloy consisted of γ-Nb₅Si₃. Minor B was prioritized into Nbss and redundant one dissolved into silicide enhanced volume fraction of the silicide.
With increasing concentrations of boron, the microstructure was refined at first and then coarsened, while the tensile strength was enhanced remarkably. Compared with other two alloys, the 0.10B alloy containing γ-Nb₅Si₃ shows both the best fracture toughness and oxidation resistance. The important roles of γ-Nb₅Si₃ in balancing overall properties are emphasized.
Multiplexed stimulated emission depletion nanoscopy (mSTED) for 5-color live-cell long-term imaging of organelle interactome
Yuran Huang, Zhimin Zhang, Wenli Tao, Yunfei Wei, Liang Xu, Wenwen Gong, Jiaqiang Zhou, Liangcai Cao, Yong Liu, Yubing Han, Cuifang Kuang, Xu Liu
Opto-Electronic Advances
2024-07-05